Xu Wang, Fucong Chen, Zefeng Lin, et al., “On the path to high-temperature josephson multi-junction devices,” Electromagnetic Science, vol. 2, no. 3, article no. 0070092, 2024. doi: 10.23919/emsci.2024.0009
Citation: Xu Wang, Fucong Chen, Zefeng Lin, et al., “On the path to high-temperature josephson multi-junction devices,” Electromagnetic Science, vol. 2, no. 3, article no. 0070092, 2024. doi: 10.23919/emsci.2024.0009

On the Path to High-Temperature Josephson Multi-Junction Devices

  • We report our progress in the high-temperature superconductor (HTS) Josephson junction fabrication process founded on utilizing a focused helium ion beam damaging technique and discuss the expected device performance attainable with the HTS multi-junction device technology. Both the achievable high value of characteristic voltage V_c=I_c R_N of Josephson junctions and the ability to design a large number of arbitrary located Josephson junctions allow narrowing the existing gap in design abilities for low-temperature superconductor (LTS) and HTS circuits even with using a single YBa2Cu3O7–x film layer. A one-layer topology of active electrically small antenna is suggested and its voltage response characteristics are considered.
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